Txais tos rau peb lub vev xaib!

NiTa Sputtering Target High Purity Thin Film Pvd Txheej Custom Made

Nickel Tantalum Cov

Lus piav qhia luv luv:

Qeb

Alloy Sputtering Target

Tshuaj Formula

NiTa

Kev sib xyaw

Nickel tantalum khoom

Purity

99.9%, 99.95%, 99.99%

Cov duab

Phaj, Kem Hom Phiaj, arc cathodes, Custom-made

Txheej txheem ntau lawm

Nqus Melting, PM

Muaj Qhov Loj

L≤200mm, W≤200mm


Product Detail

Khoom cim npe

Nickel Tantalum Sputtering Targets yog tsim los ntawm lub tshuab nqus tsev melting los yog hmoov metallurgical txheej txheem.Nws muaj siab purity thiab homogeneous microstructure.

Nickel Tantalum Sputtering Targets yog siv dav hauv aerospace, aircraft, navigation industries.Nws qhov kev ua haujlwm zoo rau qhov kub thiab txias ntawm qhov chaw reactivity yog los ntawm ntau npaum li cas ntawm Tantalum tam sim no nyob rau hauv cov hlau, uas muaj ib tug siab melting kub ntawm 3000 ° C.Aluminium, Yttrium thiab Chronium feem ntau yog ntxiv txhawm rau txhawm rau txhim kho cov khoom.

Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Cov Sputtering Target thiab tuaj yeem tsim cov khoom siv Nickel Tantalum Sputtering raws li cov neeg siv khoom tshwj xeeb.Yog xav paub ntxiv, thov hu rau peb.


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