Magnetron sputtering txheej yog ib txoj kev tshiab lub cev vapor txheej, piv nrog cov txheej txheem ua ntej evaporation txheej, nws qhov zoo ntawm ntau yam yog qhov zoo heev.Raws li ib tug paub tab technology, magnetron sputtering tau siv nyob rau hauv ntau lub teb.
Magnetron sputtering txoj cai:
Ib qho orthogonal magnetic teb thiab hluav taws xob teb yog ntxiv ntawm sputtered lub hom phiaj ncej (cathode) thiab cov anode, thiab qhov yuav tsum tau inert gas (feem ntau Ar gas) yog sau nyob rau hauv lub siab nqus chamber.Cov hlau nplaum ruaj khov ua rau 250-350 gaus magnetic teb rau ntawm qhov chaw ntawm lub hom phiaj cov khoom, thiab lub orthogonal electromagnetic teb yog tsim nrog high voltage hluav taws xob teb.Nyob rau hauv cov nyhuv ntawm hluav taws xob teb, Ar gas ionization rau hauv zoo ions thiab electrons, lub hom phiaj thiab muaj tej yam tsis zoo siab, los ntawm lub hom phiaj los ntawm tus ncej los ntawm cov nyhuv ntawm magnetic teb thiab ua hauj lwm roj ionization probability nce, tsim ib tug siab ceev plasma nyob ze ntawm lub cathode, Ar ion nyob rau hauv qhov kev txiav txim ntawm lorentz quab yuam, ceev kom ya mus rau lub hom phiaj nto, bombarding lub hom phiaj nto ntawm ib tug ceev ceev, Lub sputtered atoms ntawm lub hom phiaj ua raws li lub hauv paus ntsiab lus ntawm lub zog hloov dua siab tshiab thiab ya tawm ntawm lub hom phiaj nto nrog siab kinetic. lub zog rau lub substrate deposition zaj duab xis.
Magnetron sputtering feem ntau muab faib ua ob hom: DC sputtering thiab RF sputtering.Lub hauv paus ntsiab lus ntawm DC sputtering khoom yog yooj yim, thiab tus nqi yog ceev thaum sputtering hlau.Kev siv RF sputtering yog qhov dav dua, ntxiv rau sputtering cov khoom siv hluav taws xob, tab sis kuj sputtering cov ntaub ntawv uas tsis yog-conductive, tab sis kuj reactive sputtering npaj ntawm oxides, nitrides thiab carbides thiab lwm yam ntaub ntawv compound.Yog tias qhov zaus ntawm RF nce, nws dhau los ua microwave plasma sputtering.Tam sim no, electron cyclotron resonance (ECR) hom microwave plasma sputtering feem ntau yog siv.
Magnetron sputtering txheej hom phiaj cov khoom:
Hlau sputtering lub hom phiaj cov khoom, txheej alloy sputtering txheej khoom, ceramic sputtering txheej khoom, boride ceramic sputtering phiaj cov ntaub ntawv, carbide ceramic sputtering phiaj cov khoom, fluoride ceramic sputtering phiaj cov khoom, nitride ceramic sputtering phiaj cov ntaub ntawv, oxide ceramic phiaj, selenide ceramic sputtering phiaj cov khoom, silicide ceramic sputtering phiaj cov ntaub ntawv, sulfide ceramic sputtering phiaj cov khoom, Telluride ceramic sputtering phiaj, lwm yam ceramic phiaj, chromium-doped silicon oxide ceramic phiaj (CR-SiO), indium phosphide phiaj (InP), lead arsenide phiaj (PbAs), indium arsenide phiaj (InAs).
Post lub sij hawm: Aug-03-2022