Hais txog daim ntawv thov thiab lub hauv paus ntsiab lus ntawm sputtering lub hom phiaj thev naus laus zis, qee cov neeg siv khoom tau sab laj RSM, tam sim no rau qhov teeb meem no uas muaj kev txhawj xeeb ntau dua, cov kws tshaj lij qhia qee qhov kev paub tshwj xeeb.
Sputtering target daim ntawv thov:
Cov khoom siv hluav taws xob (xws li argon ions) ua rau cov khoom ntog, ua rau cov khoom nto, xws li atoms, molecules lossis cov pob kom khiav tawm ntawm qhov chaw ntawm cov khoom tshwm sim hu ua "sputtering".Nyob rau hauv magnetron sputtering txheej, qhov zoo ions tsim los ntawm argon ionization feem ntau yog siv los foob cov khoom (lub hom phiaj), thiab cov sputtered nruab nrab atoms tso rau ntawm lub substrate (workpiece) los tsim ib zaj duab xis txheej.Magnetron sputtering txheej muaj ob yam ntxwv: "tsis kub" thiab "ceev".
Magnetron sputtering txoj cai:
Ib qho orthogonal magnetic teb thiab hluav taws xob teb yog ntxiv ntawm sputtered lub hom phiaj ncej (cathode) thiab cov anode, thiab qhov yuav tsum tau inert gas (feem ntau Ar gas) yog sau nyob rau hauv lub siab nqus chamber.Cov hlau nplaum ruaj khov ua rau 250-350 Gauss magnetic teb rau ntawm qhov chaw ntawm lub hom phiaj cov khoom, thiab tsim ib qho orthogonal electromagnetic teb nrog lub siab voltage hluav taws xob teb.
Nyob rau hauv qhov kev txiav txim ntawm hluav taws xob teb, Ar gas yog ionized rau hauv zoo ions thiab electrons, thiab muaj ib tug tej yam tsis zoo siab siab rau lub hom phiaj, yog li cov electrons tawm ntawm lub hom phiaj ncej yog cuam tshuam los ntawm lub magnetic teb thiab ionization tshwm sim ntawm kev ua hauj lwm. gas nce.Lub plasma high-density yog tsim nyob ze ntawm lub cathode, thiab Ar ions nrawm mus rau lub hom phiaj nto nyob rau hauv qhov kev txiav txim ntawm Lorentz quab yuam thiab bombard lub hom phiaj nto ntawm ib tug ceev ceev, kom lub sputtered atoms ntawm lub hom phiaj khiav tawm ntawm lub hom phiaj nto nrog siab. kinetic zog thiab ya mus rau lub substrate los tsim ib zaj duab xis raws li lub hauv paus ntsiab lus ntawm momentum conversion.
Magnetron sputtering feem ntau muab faib ua ob hom: DC sputtering thiab RF sputtering.Lub hauv paus ntsiab lus ntawm DC sputtering khoom yog yooj yim, thiab tus nqi yog ceev thaum sputtering hlau.Kev siv RF sputtering yog qhov dav dua, ntxiv rau sputtering cov khoom siv hluav taws xob, tab sis kuj sputtering cov ntaub ntawv uas tsis yog-conductive, tab sis kuj reactive sputtering npaj ntawm oxides, nitrides thiab carbides thiab lwm yam ntaub ntawv compound.Yog tias qhov zaus ntawm RF nce, nws dhau los ua microwave plasma sputtering.Tam sim no, electron cyclotron resonance (ECR) hom microwave plasma sputtering feem ntau yog siv.
Post lub sij hawm: Aug-01-2022