Qhov zoo thiab qhov tsis zoo ntawm sputtering txheej tshuab

Tsis ntev los no, ntau tus neeg siv tau nug txog qhov zoo thiab qhov tsis zoo ntawm sputtering txheej tshuab, Raws li cov kev xav tau ntawm peb cov neeg siv khoom, tam sim no cov kws tshaj lij ntawm RSM Technology Department yuav qhia rau peb, vam tias yuav daws teeb meem.Tej zaum muaj cov ntsiab lus hauv qab no:

　　1, Tsis sib npaug magnetron sputtering

Piv txwv tias qhov sib nqus flux dhau los ntawm sab hauv thiab sab nraud magnetic ncej kawg ntawm magnetron sputtering cathode tsis sib npaug, nws yog ib qho tsis sib npaug magnetron sputtering cathode.Qhov sib nqus ntawm qhov zoo tib yam magnetron sputtering cathode yog concentrated nyob ze ntawm lub hom phiaj nto, thaum lub magnetic teb ntawm lub unbalanced magnetron sputtering cathode radiates tawm ntawm lub hom phiaj.Qhov sib nqus ntawm qhov zoo tib yam magnetron cathode nruj nruj txwv tsis pub cov ntshav nyob ze ntawm lub hom phiaj nto, thaum lub plasma nyob ze ntawm lub substrate tsis muaj zog heev, thiab lub substrate yuav tsis bombarded los ntawm muaj zog ions thiab electrons.Qhov tsis sib npaug magnetron cathode magnetic teb tuaj yeem txuas lub plasma kom deb ntawm lub hom phiaj saum npoo thiab raus lub substrate.

　　2, Xov tooj cua zaus (RF) sputtering

Lub hauv paus ntsiab lus ntawm depositing insulating zaj duab xis: ib tug tsis zoo muaj peev xwm yog siv rau tus neeg xyuas pib muab tso rau sab nraum qab ntawm lub hom phiaj insulating.Nyob rau hauv lub glow discharge plasma, thaum lub zoo ion qhia phaj ceev, nws bombards lub insulating lub hom phiaj nyob rau hauv pem hauv ntej ntawm nws mus sputter.Qhov no sputtering tsuas kav ntev li 10-7 vib nas this.Tom qab ntawd, qhov muaj peev xwm zoo tsim los ntawm cov nqi zoo tau sau rau ntawm lub hom phiaj insulating offsets qhov tsis zoo ntawm cov neeg xyuas pib phaj, yog li lub foob pob hluav taws xob zoo ions ntawm lub hom phiaj insulating yog nres.Nyob rau lub sijhawm no, yog tias qhov polarity ntawm cov khoom siv hluav taws xob thim rov qab, cov khoom siv hluav taws xob yuav ua rau lub phaj insulating thiab nruab nrab cov nqi zoo ntawm cov phaj insulating li ntawm 10-9 vib nas this, ua rau nws lub peev xwm xoom.Lub sijhawm no, thim rov qab lub polarity ntawm lub hwj huam mov tuaj yeem tsim sputtering rau 10-7 vib nas this.

Qhov zoo ntawm RF sputtering: ob lub hom phiaj hlau thiab lub hom phiaj dielectric tuaj yeem sputtered.

　　3, DC magnetron sputtering

Lub magnetron sputtering txheej cov cuab yeej ua kom cov hlau nplaum hauv DC sputtering cathode lub hom phiaj, siv Lorentz quab yuam ntawm cov hlau nplaum los khi thiab txuas ntxiv txoj hauv kev ntawm cov hluav taws xob hauv hluav taws xob, ua rau muaj kev sib tsoo ntawm electrons thiab roj atoms, nce qhov ionization tus nqi ntawm cov roj atoms, nce tus naj npawb ntawm high-zog ions bombarding lub hom phiaj thiab txo tus naj npawb ntawm high-zog electrons bombarding lub plated substrate.

Qhov zoo ntawm planar magnetron sputtering:

1. Lub hom phiaj lub zog ceev tuaj yeem ncav cuag 12w / cm2;

2. Lub hom phiaj voltage tuaj yeem ncav cuag 600V;

3. Cov roj siab tuaj yeem ncav cuag 0.5pa.

Qhov tsis zoo ntawm cov phiaj xwm magnetron sputtering: lub hom phiaj tsim cov kab sib txuas hauv qhov chaw khiav, qhov etching ntawm tag nrho lub hom phiaj nto tsis sib xws, thiab kev siv tus nqi ntawm lub hom phiaj tsuas yog 20% ​​- 30%.

　　4, Intermediate zaus AC magnetron sputtering

Nws yog hais txog tias nyob rau hauv nruab nrab zaus AC magnetron sputtering cov cuab yeej, feem ntau yog ob lub hom phiaj nrog tib qhov loj thiab cov duab yog configured ib sab ntawm sab, feem ntau hu ua ntxaib lub hom phiaj.Lawv yog suspended installations.Feem ntau, ob lub hom phiaj yog siv rau tib lub sijhawm.Nyob rau hauv tus txheej txheem ntawm nruab nrab zaus AC magnetron reactive sputtering, ob lub hom phiaj ua raws li anode thiab cathode nyob rau hauv lem, thiab lawv ua raws li anode cathode ib leeg nyob rau hauv tib ib nrab voj voog.Thaum lub hom phiaj yog nyob rau ntawm qhov tsis zoo ib nrab lub voj voog muaj peev xwm, lub hom phiaj nto yog foob pob thiab sputtered los ntawm qhov zoo ions;Nyob rau hauv qhov zoo ib nrab voj voog, cov electrons ntawm lub plasma yog nrawm mus rau lub hom phiaj nto kom tsis txhob muaj qhov zoo ntawm cov nqi sib sau rau ntawm qhov chaw insulating ntawm lub hom phiaj nto, uas tsis tsuas yog suppresses lub ignition ntawm lub hom phiaj nto, tab sis kuj tshem tawm qhov tshwm sim ntawm " anode ploj."

Qhov zoo ntawm qhov nruab nrab zaus ob lub hom phiaj reactive sputtering yog:

(1) High deposition tus nqi.Rau cov hom phiaj silicon, qhov tso nyiaj ntawm qhov nruab nrab zaus reactive sputtering yog 10 npaug ntawm DC reactive sputtering;

(2) Cov txheej txheem sputtering tuaj yeem ruaj khov ntawm qhov chaw ua haujlwm;

(3) Qhov tshwm sim ntawm "ignition" raug tshem tawm.Qhov tsis xws luag ntawm qhov npaj insulating zaj duab xis yog ntau qhov kev txiav txim siab tsawg dua li ntawm DC reactive sputtering txoj kev;

(4) Kev kub siab substrate yog qhov zoo los txhim kho qhov zoo thiab adhesion ntawm zaj duab xis;

(5) Yog tias cov khoom siv hluav taws xob yooj yim dua kom haum rau lub hom phiaj tshaj RF fais fab mov.

　　5, Reactive magnetron sputtering

Nyob rau hauv cov txheej txheem sputtering, cov tshuaj tiv thaiv roj yog pub kom hnov ​​​​mob nrog cov sputtered hais los tsim cov yeeb yaj kiab sib xyaw.Nws tuaj yeem muab cov roj reactive los ua rau lub hom phiaj ntawm sputtering compound lub hom phiaj tib lub sijhawm, thiab nws tseem tuaj yeem muab cov pa roj reactive los ua rau lub hom phiaj ntawm sputtering hlau los yog alloy lub hom phiaj tib lub sijhawm los npaj cov yeeb yaj kiab sib xyaw nrog cov tshuaj sib piv.

Qhov zoo ntawm reactive magnetron sputtering compound films:

(1) Lub hom phiaj cov ntaub ntawv thiab cov tshuaj tiv thaiv gases siv yog cov pa oxygen, nitrogen, hydrocarbons, thiab lwm yam., uas feem ntau yog yooj yim kom tau txais high-purity khoom, uas yog haum rau kev npaj ntawm high-purity compound films;

(2) Los ntawm kev kho cov txheej txheem tsis, tshuaj lom neeg lossis tsis muaj tshuaj lom neeg cov yeeb yaj kiab tuaj yeem npaj tau, kom cov yam ntxwv ntawm cov yeeb yaj kiab tuaj yeem hloov kho;

(3) Lub substrate kub tsis siab, thiab muaj ob peb txwv ntawm substrate;

(4) Nws yog qhov tsim nyog rau thaj tsam loj txheej txheej thiab paub txog kev tsim khoom lag luam.

Nyob rau hauv tus txheej txheem ntawm reactive magnetron sputtering, qhov instability ntawm compound sputtering yog ib qho yooj yim tshwm sim, feem ntau suav nrog:

(1) Nws yog qhov nyuaj rau kev npaj cov hom phiaj sib xyaw;

(2) Qhov tshwm sim ntawm arc striking (arc paug) tshwm sim los ntawm lub hom phiaj lom thiab tsis ruaj khov ntawm cov txheej txheem sputtering;

(3) Tsawg sputtering deposition tus nqi;

(4) Qhov tsis xws luag ntawm zaj duab xis yog siab.