CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Txheej Custom Made

Cobalt Iron Tantalum Zirconium sputtering lub hom phiaj yog tsim los ntawm lub tshuab nqus tsev melting.Cov txheej txheem tsim khoom no tuaj yeem tiv thaiv cov khoom tseem ceeb ntawm oxidation thiab xyuas kom meej homogenous microstructure, uniformed grain loj thiab siab sib xws ntawm cov deposited films.

Tom qab kev kho cua sov, PTF ntawm lub hom phiaj tuaj yeem txhim kho tau zoo, yog li nws feem ntau siv rau cov khoom siv sib nqus mos hauv cov ntaub ntawv sib nqus sib nqus.

Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Khoom ntawm Sputtering Target thiab tuaj yeem tsim Cobalt Iron Tantalum Zirconium Sputtering Materials raws li cov neeg siv khoom tshwj xeeb.Yog xav paub ntxiv, thov hu rau peb.