Tungsten Silicide
Tungsten Silicide
Tungsten silicide WSi2 yog siv los ua cov khoom siv hluav taws xob hauv microelectronics, shunting ntawm polysilicon xov hlau, anti-oxidation txheej thiab tiv thaiv hlau txheej.Tungsten silicide yog siv los ua cov khoom sib txuas hauv microelectronics, nrog rau kev tiv thaiv ntawm 60-80μΩcm.Nws yog tsim ntawm 1000 ° C.Nws feem ntau yog siv los ua shunt rau polysilicon kab los ua kom nws cov conductivity thiab nce teeb liab ceev.Cov txheej tungsten Silicide tuaj yeem npaj los ntawm cov tshuaj vapor deposition, xws li vapor deposition.Siv monosilane lossis dichlorosilane thiab tungsten hexafluoride ua cov khoom siv roj.Cov zaj duab xis deposited yog non-stoichiometric thiab yuav tsum tau annealing kom hloov mus rau hauv ib tug ntau conductive stoichiometric daim ntawv.
Tungsten silicide tuaj yeem hloov cov tungsten zaj duab xis ua ntej.Tungsten silicide kuj tseem siv los ua ib txheej txheej ntawm silicon thiab lwm yam hlau.
tungsten silicide kuj tseem ceeb heev hauv microelectromechanical systems, ntawm cov tungsten silicide feem ntau yog siv los ua ib zaj duab xis nyias rau kev tsim microcircuits.Rau lub hom phiaj no, tungsten silicide zaj duab xis tuaj yeem siv plasma-etched, piv txwv li, silicide.
| Yam khoom | Tshuaj muaj pes tsawg leeg | |||||
| Element | W | C | P | Fe | S | Si |
| Cov ntsiab lus (wt%) | 76.22 ib | 0.01 ib | 0.001 ib | 0.12 | 0.004 ib | Tshuav |
Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Cov Txheej Txheem Sputtering thiab tuaj yeem tsim cov khoom siv tungsten Silicide Sputtering raws li cov neeg siv khoom tshwj xeeb.Yog xav paub ntxiv, thov hu rau peb.
