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CrAlW Alloy Sputtering Target High Purity Thin Film Pvd Txheej Custom Made

Chrome Aluminium Tungsten

Lus piav qhia luv luv:

Qeb

Alloy Sputtering Target

Tshuaj Formula

CrAlW

Kev sib xyaw

Chrome Aluminium Tungsten

Purity

99.7%, 99.9%, 99.95%, 99.99%

Cov duab

Phaj, Kem Hom Phiaj, arc cathodes, Custom-made

Txheej txheem ntau lawm

PM

Muaj Qhov Loj

L≤2000mm, W≤200mm


Product Detail

Khoom cim npe

Chrome Aluminium tungsten sputtering lub hom phiaj yog tsim los ntawm cov hmoov hlau metallurgy kom ua tiav siab purity, homogeneous microstructure, siab ceev thiab siab hluav taws xob conductivity.

Chrome Aluminium Tungsten alloy yog cov khoom siv zoo tshaj plaws rau kev sib txuas thiab electrodes kev lag luam.Nws muaj du nto, siab deposition tus nqi, toughness, dielectric zog, thiab yuav ua tau zoo sib xyaw nrog substrate khoom.

Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Khoom Sputtering Target thiab tuaj yeem tsim Chronium Aluminium tungsten Sputtering Materials raws li cov neeg siv khoom tshwj xeeb.Peb cov khoom muaj cov purity siab, homogeneous qauv, siab ceev uas tsis muaj segregation, pores los yog tawg.Yog xav paub ntxiv, thov hu rau peb.


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