Txais tos rau peb lub vev xaib!

CrAl Alloy Sputtering Target High Purity nyias zaj duab xis PVD txheej Custom Made

Chromium Aluminium

Lus piav qhia luv luv:

Qeb

Alloy Sputtering Target

Tshuaj Formula

CrAl

Kev sib xyaw

Chromium Aluminium

Purity

99.7%, 99.9%, 99.95%, 99.99%

Cov duab

Phaj, Kem Hom Phiaj, arc cathodes, Custom-made

Txheej txheem ntau lawm

Nqus Melting, PM

Muaj Qhov Loj

L≤2000mm, W≤200mm


Product Detail

Khoom cim npe

Kev tsim ntawm Chromium Aluminium Sputtering Targets suav nrog cov kauj ruam hauv qab no:

1. hmoov sib tsoo thiab sib tov.

2. Kub isostatic nias kho kom tau txais cov khoom tiav.

3. Machining cov ntxhib chromium aluminium alloy sputtering lub hom phiaj cov khoom kom tau txais cov chromium aluminium alloy sputtering phiaj cov khoom.

Thaum lub sij hawm deposition txheej txheem ntawm CrAl sputtering lub hom phiaj, ib tug nyuaj Aluminium-Chrom-Nitrid (AlCrN) txheej yog tsim.Cov txheej no qhia tau hais tias muaj zog hardness thiab oxidation tsis kam txawm tias kub.Cov cutters tuaj yeem khiav ntawm cov khoom noj siab kom ua tau zoo thiab nce qhov zoo thaum siv cov tshuab CNC.

Peb cov hom phiaj AlCr thiab lawv cov khoom

Cr-70 Alntawm%

Cr-60 Alntawm%

Cr-50 Alntawm%

Purity (%)

99.8 / 99.9 / 99.95

99.8 / 99.9 / 99.95

99.8 / 99.9 / 99.95

Qhov ntom(g/cm3)

3.7

4.35

4.55 ib

Gnag Loj(µm)

100/50

100/50

100/50

Txheej txheem

HIP

HIP

HIP

Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Khoom ntawm Sputtering Target thiab tuaj yeem tsim Aluminium Chromium Sputtering Materials raws li cov neeg siv khoom tshwj xeeb.Peb cov khoom muaj cov khoom siv zoo heev, cov qauv zoo sib xws, polished nto tsis muaj kev sib cais, qhov pores lossis tawg.Yog xav paub ntxiv, thov hu rau peb.


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