AlTa Sputtering Target High Purity nyias zaj duab xis PVD txheej Custom Made
Aluminium-Tantalum
Lub hom phiaj yog npaj los ntawm kev sib xyaw Aluminium thiab Tantalum hmoov los yog lub tshuab nqus tsev melting ua raws li kev cog lus kom tag nrho.Yog li cov ntaub ntawv compacted yog optionally sintered thiab yog ces tsim rau hauv lub hom phiaj hom.
Aluminium Tantalum sputtering lub hom phiaj muaj siab purity, homogeneous microstructure thiab zoo heev conductivity.Nws yog dav siv hauv kev tsim cov yeeb yaj kiab nyias rau kev lag luam vaj huam sib luag.Aluminium Tantalum kuj tseem tuaj yeem muab ntxiv los tsim kev ua haujlwm siab Titanium alloy los txhim kho nws qhov kub thiab txias.
Cov ntsiab lus impurity ntawm Al-Ta alloy
muaj pes tsawg leeg | Cov ntsiab lus(%) | ||||
Ta | Fe | Si | C | O | |
AlTa60 | 55.0 ~ 65.0 | ≤ 0.05 | ≤ 0.02 | ≤ 0.01 | ≤ 0.05 |
AlTa70 | 65.0 ~ 75.0 hli | ≤ 0.05 | ≤ 0.02 | ≤ 0.01 | ≤ 0.05 |
Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Khoom ntawm Sputtering Target thiab tuaj yeem tsim Aluminium Tantalum Sputtering Materials raws li cov neeg siv khoom tshwj xeeb.Peb cov khoom muaj cov khoom siv zoo heev, cov qauv zoo sib xws, polished nto tsis muaj kev sib cais, qhov pores lossis tawg.Yog xav paub ntxiv, thov hu rau peb.